The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Mar. 08, 2013
Applicant:

Alta Devices, Inc., Sunnyvale, CA (US);

Inventors:

Vladimir Galburt, Campbell, CA (US);

Alexander Lerner, San Jose, CA (US);

Brian Brown, Palo Alto, CA (US);

Assignee:

Alta Devices, Inc., Sunnyvale, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02104 (2013.01);
Abstract

A substrate processing system architecture includes an MOCVD reactor processing module coupled to a single three-level load lock chamber. The load lock has a heater at a first stationary location, a cold plate at a second secondary location, and a three-level transport system between the heater and cold plate. The transport system has two-position carrier transfer assembly with upper and lower stages, where the upper stage may move between an intermediate transfer level and an upper level proximate to the heater while the lower stage moves between a lower level proximate to the cold plate and the transfer level. The choreography of substrate transport between external loader, load lock and reactor allows substrates to be processed in the reactor while other substrates are post-process cooled, unloaded, and a new substrate loaded and preheated.


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