The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Mar. 31, 2011
Applicant:
Rainer Knippelmeyer, Munich, DE;
Inventor:
Rainer Knippelmeyer, Munich, DE;
Assignees:
APPLIED MATERIALS ISRAEL LTD., Rehovot, IL;
CARL ZEISS MICROSCOPY GMBH, Jena, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); H01J 37/09 (2013.01); H01J 2237/0437 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01);
Abstract
A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.