The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2016
Filed:
Mar. 28, 2013
Jsr Corporation, Tokyo, JP;
Kazuki Kasahara, Tokyo, JP;
Norihiko Ikeda, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A photoresist composition includes a polymer component that includes a first structural unit represented by the formula (1) and a second structural unit represented by the formula (2), an acid generator, and a compound represented by the formula (3). The first structural unit and the second structural unit are included in an identical polymer, or different polymers. Ris hydrogen atom, fluorine atom, etc., Rand Rare independently hydrogen atom, fluorine atom, etc., a is an integer from 1 to 6, Rand Rindependently hydrogen atom, fluorine atom, etc., Ris hydrogen atom, fluorine atom, etc., Rand Rare each independently alkyl group having 1 to 4 carbon atoms, etc., Ris alkyl group having 1 to 4 carbon atoms, etc., Ris hydrogen atom, etc., Ais —N—SO—R, etc., and Xis onium cation.