The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Nov. 15, 2011
Erwin John Van Zwet, Pijnacker, NL;
Pieter Willem Herman DE Jager, Middelbeers, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Hendrik DE Man, Hendrik Ido Amabacht, NL;
Erwin John Van Zwet, Pijnacker, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Hendrik De Man, Hendrik Ido Amabacht, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.