The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Feb. 27, 2012
Shohei Kataoka, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Shoichi Saitoh, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Fumihiro Yoshino, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Shuhei Yamaguchi, Shizuoka, JP;
Shoichi Saitoh, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Fumihiro Yoshino, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.