The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2016
Filed:
Apr. 23, 2014
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventors:
Hsin-Yu Chen, Nantou County, TW;
Chia-Wei Huang, Kaohsiung, TW;
Chun-Hsien Huang, Tainan, TW;
Shih-Chun Tsai, Pingtung County, TW;
Kai-Lin Chuang, Tainan, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Science-Based Industrial Park, Hsin-Chu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01); G03F 1/68 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/68 (2013.01);
Abstract
A method for forming patterns includes the following steps. A first layout including a first target pattern and a first unprintable dummy pattern is provided. A second layout including a second target pattern and a second printable dummy pattern are provided, wherein at least part of the second printable dummy pattern overlaps the first unprintable dummy pattern exposure limit, such that the second printable dummy pattern cannot be formed in a wafer.