The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2016

Filed:

Aug. 20, 2012
Applicants:

Hak-sun Lee, Seoul, KR;

Tokashiki Ken, Seongnam-si, KR;

Myeong-cheol Kim, Suwon-si, KR;

Hyung-joon Kwon, Seongnam-si, KR;

Sang-min Lee, Hwaseong-si, KR;

Woo-cheol Lee, Suwon-Si, KR;

Myung-hoon Jung, Suwon-Si, KR;

Inventors:

Hak-sun Lee, Seoul, KR;

Tokashiki Ken, Seongnam-si, KR;

Myeong-cheol Kim, Suwon-si, KR;

Hyung-joon Kwon, Seongnam-si, KR;

Sang-min Lee, Hwaseong-si, KR;

Woo-cheol Lee, Suwon-Si, KR;

Myung-hoon Jung, Suwon-Si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 43/12 (2006.01); B81C 1/00 (2006.01); B82Y 10/00 (2011.01); B82Y 25/00 (2011.01); G11B 5/31 (2006.01); H01L 27/22 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01); B81C 1/00531 (2013.01); B82Y 10/00 (2013.01); B82Y 25/00 (2013.01); G11B 5/3163 (2013.01); H01L 21/3065 (2013.01); H01L 27/228 (2013.01); Y10T 428/24479 (2015.01);
Abstract

Magnetic devices, and methods of manufacturing the same, include a stack structure including at least one magnetic layer, etched using an etching gas including at least 70 volume percent of a hydrogen-containing gas and at least 2 volume percent of CO gas.


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