The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Apr. 20, 2010
Binh Tran, Houston, TX (US);
Anqing Cui, Palo Alto, CA (US);
Bernard L. Hwang, Santa Clara, CA (US);
Son T. Nguyen, San Jose, CA (US);
Anh N. Nguyen, Milpitas, CA (US);
Sean M. Seutter, San Jose, CA (US);
Xianzhi Tao, San Jose, CA (US);
Binh Tran, Houston, TX (US);
Anqing Cui, Palo Alto, CA (US);
Bernard L. Hwang, Santa Clara, CA (US);
Son T. Nguyen, San Jose, CA (US);
Anh N. Nguyen, Milpitas, CA (US);
Sean M. Seutter, San Jose, CA (US);
Xianzhi Tao, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments of the invention provide improved apparatus for depositing layers on substrates, such as by chemical vapor deposition (CVD). The inventive apparatus disclosed herein may advantageously facilitate one or more of depositing films having reduced film thickness non-uniformity within a given process chamber, improved particle performance (e.g., reduced particles on films formed in the process chamber), chamber-to-chamber performance matching amongst a plurality of process chambers, and improved process chamber serviceability.