The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Mar. 12, 2012
Kenji Nishi, Kumamoto, JP;
Kazuhiro Takeshita, Kumamoto, JP;
Nobuhiro Ogata, Kumamoto, JP;
Satoru Tanaka, Kumamoto, JP;
Shogo Mizota, Kumamoto, JP;
Kenji Nishi, Kumamoto, JP;
Kazuhiro Takeshita, Kumamoto, JP;
Nobuhiro Ogata, Kumamoto, JP;
Satoru Tanaka, Kumamoto, JP;
Shogo Mizota, Kumamoto, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a liquid processing apparatus including a rotation unit configured to hold the target substrate and rotate the target substrate around a vertical axis; a processing solution supply nozzle configured to supply the processing solution to the surface of the target substrate being rotated; a first gas supply unit configured to form a downward flow of a first gas that flows over the entire surface of the target substrate and is introduced into a cup in order to form a processing atmosphere suitable for a liquid process to be performed; and a second gas supply unit configured to form a downward flow of a second gas different from the first gas in a region outside the downward flow of the first gas. The first gas supply unit and the second gas supply unit are provided at a ceiling portion of the housing serving as the processing space.