The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Aug. 16, 2011
Ming-hsi Yeh, Hsinchun, TW;
Kuo-sheng Chuang, Hsinchu, TW;
Ying-hsueh Chang Chien, New Taipei, TW;
Chi-ming Yang, Hsian-San District, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Ming-Hsi Yeh, Hsinchun, TW;
Kuo-Sheng Chuang, Hsinchu, TW;
Ying-Hsueh Chang Chien, New Taipei, TW;
Chi-Ming Yang, Hsian-San District, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method includes providing a wafer and providing a first spray bar spaced a distance from the wafer. A first spray is dispensed from the first spray bar onto a first portion (e.g., half) of the wafer. Thereafter, the wafer is rotated. A second spray is dispensed from the first spray bar onto a second portion (e.g., half) of the rotated wafer. In embodiments, a plurality of spray bars are positioned above the wafer. One or more of the spray bars may be tunable in separation distance and/or angle of dispensing.