The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Feb. 27, 2012
Viktor Kulitzki, Zwickau, DE;
Bernhard Gellrich, Aalen, DE;
Stefan Xalter, Oberkochen, DE;
Yim-bun Patrick Kwan, Aalen, DE;
Peter Deufel, Koenigsbronn, DE;
Andreas Wurmbrand, Aalen, DE;
Viktor Kulitzki, Zwickau, DE;
Bernhard Gellrich, Aalen, DE;
Stefan Xalter, Oberkochen, DE;
Yim-Bun Patrick Kwan, Aalen, DE;
Peter Deufel, Koenigsbronn, DE;
Andreas Wurmbrand, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.