The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2016

Filed:

Sep. 11, 2014
Applicant:

National Center for Advanced Packaging Co., Ltd., Wuxi, Jiangsu, CN;

Inventors:

Kai Xue, Wuxi, CN;

Daquan Yu, Wuxi, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/00 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76898 (2013.01); H01L 21/32115 (2013.01); H01L 21/32125 (2013.01); H01L 21/76841 (2013.01); H01L 24/03 (2013.01); H01L 21/7684 (2013.01); H01L 24/05 (2013.01); H01L 24/13 (2013.01); H01L 2224/02372 (2013.01); H01L 2224/02377 (2013.01); H01L 2224/0391 (2013.01); H01L 2224/03462 (2013.01); H01L 2224/03914 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/05548 (2013.01); H01L 2224/05567 (2013.01); H01L 2224/05647 (2013.01); H01L 2224/1134 (2013.01); H01L 2224/13022 (2013.01); H01L 2224/13024 (2013.01); H01L 2924/00014 (2013.01); H01L 2924/12042 (2013.01);
Abstract

A method for avoiding using CMP for eliminating electroplated copper facets and reusing barrier layer in the back end of line ('BEOL') manufacturing processes. Electropolishing is employed to remove the deposited surface metal, stopping at the barrier layer to form a smooth surface that may be utilized in subsequent steps. The method is suitable for the electropolishing of metal surfaces after formation of filled vias for through-silicon via processes employing metals such as copper, tungsten, aluminum, or alloys thereof. The remaining barrier layer may be reused to fabricate the redistribution layer.


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