The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2016

Filed:

May. 12, 2014
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

Ernest E. Allen, Rockport, MA (US);

Jon Ballou, Beverly, MA (US);

Kevin M. Daniels, Lynnfield, MA (US);

James P. Buonodono, Amesbury, MA (US);

Joseph P. Dzengeleski, Newton, NH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/20 (2006.01); G21K 5/08 (2006.01); H01J 37/304 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G21K 5/08 (2013.01); H01J 37/304 (2013.01); H01J 37/3053 (2013.01); H01J 37/3171 (2013.01);
Abstract

A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The apparatus may further include a platen disposed within the process chamber for supporting a substrate, and an ion beam current sensor that is disposed adjacent to the platen.


Find Patent Forward Citations

Loading…