The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Sep. 10, 2012
Stanislav Y Smirnov, Danbury, CT (US);
Lev Ryzhikov, Norwalk, CT (US);
Eric Brian Catey, Danbury, CT (US);
Adel Joobeur, Milford, CT (US);
David Heald, Brookfield, CT (US);
Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);
Richard Jacobs, Brookfield, CT (US);
Stanislav Y Smirnov, Danbury, CT (US);
Lev Ryzhikov, Norwalk, CT (US);
Eric Brian Catey, Danbury, CT (US);
Adel Joobeur, Milford, CT (US);
David Heald, Brookfield, CT (US);
Yevgeniy Konstantinovich Shmarev, Lagrangeville, NY (US);
Richard Jacobs, Brookfield, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.