The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Oct. 09, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Alexander Epple, Aalen, DE;
Vladimir Kamenov, Essingen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Thomas Schicketanz, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Catadioptric projection objectives for microlithography include: a first partial objective for imaging an object field onto a first real intermediate image; a catadioptric partial objective having one concave mirror and a lens for imaging the first intermediate image onto a second real intermediate image; a third partial objective including an aperture stop and no more than four lenses between the aperture stop and an image field, the third partial objective for imaging the second intermediate image onto the image field; and a first folding mirror for deflecting the radiation from the object plane toward the concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane. The projection objective is an immersion projection objective. At least one surface of the lens in the catadioptric partial objective has an antireflection coating including at least six layers.