The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2016
Filed:
Jan. 26, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Sander Frederik Wuister, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Johan Frederik Dijksman, Weert, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Roelof Koole, Utrecht, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); B29C 43/34 (2006.01); B44C 1/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); B29C 43/02 (2006.01); B29C 43/58 (2006.01); B29K 101/12 (2006.01);
U.S. Cl.
CPC ...
B29C 43/34 (2013.01); B29C 43/021 (2013.01); B29C 43/58 (2013.01); B44C 1/20 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); B29C 2043/025 (2013.01); B29K 2101/12 (2013.01);
Abstract
In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.