The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

May. 21, 2010
Applicants:

Joong-ki Jeong, Seoul, KR;

Min-young Kim, Seoul, KR;

Seung-jun Lee, Seoul, KR;

Inventors:

Joong-Ki Jeong, Seoul, KR;

Min-Young Kim, Seoul, KR;

Seung-Jun Lee, Seoul, KR;

Assignee:
Attorney:
Int. Cl.
CPC ...
H04N 7/18 (2006.01); G06K 9/03 (2006.01); G01B 11/25 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G06K 9/036 (2013.01); G01B 11/2531 (2013.01); G01N 2021/95638 (2013.01);
Abstract

A shape measurement apparatus includes a work stage supporting a target substrate, a pattern-projecting section including a light source, a grating part partially transmitting and blocking light generated by the light source to generate a grating image and a projecting lens part making the grating image on a measurement target of the target substrate, an image-capturing section capturing the grating image reflected by the measurement target of the target substrate, and a control section controlling the work stage, the pattern-projecting section and the image-capturing section, calculating a reliability index of the grating image and phases of the grating image, which is corresponding to the measurement target, and inspecting the measurement target by using the reliability index and the phases. Thus, the accuracy of measurement may be enhanced.


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