The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2016

Filed:

Apr. 10, 2014
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Armin Werber, Gottenheim, DE;

Severin Waldis, Bern, CH;

Florian Bach, Oberkochen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 26/0833 (2013.01); G02B 26/0841 (2013.01); G03F 7/70058 (2013.01); G03F 7/70116 (2013.01);
Abstract

An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.


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