The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2016

Filed:

Jul. 25, 2014
Applicant:

Crossbar, Inc., Santa Clara, CA (US);

Inventors:

Steven Patrick Maxwell, Sunnyvale, CA (US);

Kuk-Hwan Kim, Santa Clara, CA (US);

Sung Hyun Jo, Sunnyvale, CA (US);

Assignee:

Crossbar, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1253 (2013.01); H01L 45/1206 (2013.01); H01L 45/16 (2013.01); H01L 27/2409 (2013.01); H01L 27/249 (2013.01); H01L 27/2472 (2013.01); H01L 45/04 (2013.01); H01L 45/14 (2013.01); H01L 45/1608 (2013.01);
Abstract

Providing for low temperature deposition of silicon-based electrical conductor for solid state memory is described herein. In various disclosed embodiments, the silicon-based conductor can form an electrode of a memory cell, an interconnect between conductive components of an electronic device, a conductive via, a wire, and so forth. Moreover, the silicon-based electrical conductor can be formed as part of a monolithic process incorporating complementary metal oxide semiconductor (CMOS) device fabrication. In particular embodiments, the silicon-based electrical conductor can be a p-type silicon germanium compound, that is activated upon deposition at temperatures compatible with CMOS device fabrication.


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