The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Feb. 23, 2010
Applicants:
Stephan Kronholz, Dresden, DE;
Vassilios Papageorgiou, Austin, TX (US);
Inventors:
Stephan Kronholz, Dresden, DE;
Vassilios Papageorgiou, Austin, TX (US);
Assignee:
Advance Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 21/86 (2006.01); H01L 21/8238 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823807 (2013.01); H01L 21/823814 (2013.01); H01L 29/7848 (2013.01);
Abstract
Different strain-inducing semiconductor alloys may be incorporated into the drain and source areas of different transistors in sophisticated semiconductor devices by at least patterning the corresponding cavities in a common manufacturing sequence. Thus, the etch process may be performed on the basis of a high degree of uniformity and the subsequent epitaxial growth processes may, in some illustrative embodiments, be accomplished on the basis of only one additional lithography step.