The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
Jan. 17, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Robert Dinsmore, Sunnyvale, CA (US);
John C. Forster, Mountain View, CA (US);
Song-Moon Suh, San Jose, CA (US);
Cheng-Hsiung Tsai, Cupertino, CA (US);
Glen T. Mori, Gilroy, CA (US);
Assignee:
APPLIED MATERIALS, INC., Houston, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/02 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02063 (2013.01); H01L 21/02068 (2013.01); H01L 24/03 (2013.01); H01L 24/05 (2013.01); H01L 2224/0381 (2013.01);
Abstract
Embodiments of the present invention generally relate to a method for cleaning a processing chamber during substrate processing. During a first substrate processing step, a plasma is formed from a gas mixture of argon, helium, and hydrogen in the processing chamber. In a second substrate processing step, an argon plasma is formed in the processing chamber.