The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2016
Filed:
May. 09, 2014
Composition, resist pattern-forming method, compound, method for production of compound, and polymer
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Kiyoshi Tanaka, Tokyo, JP;
Shinya Minegishi, Tokyo, JP;
Kazunori Kusabiraki, Tokyo, JP;
Takahiro Hayama, Tokyo, JP;
Assignee:
JSR CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/038 (2006.01); C08F 220/26 (2006.01); C07C 69/734 (2006.01); G03F 7/20 (2006.01); C08F 220/22 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C07C 69/734 (2013.01); C08F 220/22 (2013.01); C08F 220/26 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); C07C 2101/14 (2013.01); G03F 7/0397 (2013.01);
Abstract
A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a single bond or a divalent organic group having 1 to 20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a perfluoroalkyl group having 1 to 5 carbon atoms. Rrepresents a hydrogen atom or a monovalent base-labile group.