The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Mar. 08, 2012
Chun-li Chou, Jhubei, TW;
Shao-yen Ku, Jhubei, TW;
Chi-yun Tseng, Longtan Township, TW;
Yu-yen Hsu, Taipei, TW;
Tsai-pao Su, Donggang Township, TW;
Hobin Chen, Xiushui Township, TW;
Sheng-chi Shih, Toufen Township, TW;
Chun-Li Chou, Jhubei, TW;
Shao-Yen Ku, Jhubei, TW;
Chi-Yun Tseng, Longtan Township, TW;
Yu-Yen Hsu, Taipei, TW;
Tsai-Pao Su, Donggang Township, TW;
Hobin Chen, Xiushui Township, TW;
Sheng-Chi Shih, Toufen Township, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A system and method for etching a substrate is provided. An embodiment comprises utilizing an inert carrier gas in order to introduce a liquid etchant to a substrate. The inert carrier gas may prevent undesirable chemical reactions from taking place during the etching process, thereby helping to reduce the number of defects that occur to the substrate and other structures during the etching process.