The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Feb. 22, 2011
Applicants:
Nobuhiro Okai, Otsu, JP;
Yasunari Sohda, Kawasaki, JP;
Junichi Tanaka, Hachioji, JP;
Inventors:
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 15/00 (2006.01); H01J 37/285 (2006.01); G01B 15/04 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01B 15/00 (2013.01); G01B 15/04 (2013.01); H01J 37/28 (2013.01); H01J 2237/2067 (2013.01); H01J 2237/221 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2817 (2013.01);
Abstract
Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S), adds the images together (S), computes the dimensions of the pattern formed on the sample () and at the same time acquires pattern information () using components of a frame image, such as a single frame image or subframe image, as a separated image ().