The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
May. 27, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshinori Makita, Utsunomiya, JP;
Tadashi Aoki, Utsunomiya, JP;
Hiroshi Isoyama, Utsunomiya, JP;
Ken Katsukura, Utsunomiya, JP;
Hiroshi Tanaka, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, , JP;
Abstract
The present invention provides a lithography apparatus for forming a pattern on a substrate, including a motor configured to drive a table for holding the substrate in accordance with a driving profile, a setting unit configured to set one of a normal mode and a power saving mode as an operation mode of the motor, and a controller configured to change the driving profile when the power saving mode is set, such that an amount of generated heat of the motor caused by driving of the table is smaller than that in the normal mode, and the number of substrates to be processed by the lithography apparatus per unit time is satisfied.