The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2016

Filed:

May. 25, 2011
Applicants:

Keiji Watanabe, Tokyo, JP;

Ryuta Tsuchiya, Tokyo, JP;

Takashi Hattori, Tokyo, JP;

Mieko Matsumura, Tokyo, JP;

Inventors:

Keiji Watanabe, Tokyo, JP;

Ryuta Tsuchiya, Tokyo, JP;

Takashi Hattori, Tokyo, JP;

Mieko Matsumura, Tokyo, JP;

Assignee:

HITACHI, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01); H01L 31/0352 (2006.01); H01L 31/0236 (2006.01);
U.S. Cl.
CPC ...
H01L 31/035281 (2013.01); H01L 31/02366 (2013.01); H01L 31/03529 (2013.01); Y02E 10/50 (2013.01);
Abstract

A solar cell including a substrate, a nanopillarhaving diameter Dconnected to the substrate, and a nanopillarhaving diameter Dconnected to the substrateis characterized in that Dis greater than Din order to realize a solar cell having, as the surface structure, a nanopillar array structure with which it is possible to prevent reflection within the broad wavelength region of solar light. A nanopillar array structureformed from two types of nanopillars having different diameters has a point of minimum reflectivity of a nanopillar array structure formed from the nanopillarhaving diameter Dand a point of minimum reflectivity of a nanopillar array structure formed from the nanopillarhaving diameter Dand therefore, is capable of preventing reflection within the broad wavelength region of solar light.


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