The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Feb. 16, 2012
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Yogesh Pramod Karade, Eindhoven, IN;
Siegfried Alexander Tromp, Papendrecht, NL;
Jacobus Josephus Leijssen, Waalre, NL;
Elisabeth Corinne Rodenburg, Heeze, NL;
Maurice Wilhelmus Leonardus Hendricus Feijts, Beek, NL;
Hendrik Huisman, Tilburg, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Yogesh Pramod Karade, Eindhoven, IN;
Siegfried Alexander Tromp, Papendrecht, NL;
Jacobus Josephus Leijssen, Waalre, NL;
Elisabeth Corinne Rodenburg, Heeze, NL;
Maurice Wilhelmus Leonardus Hendricus Feijts, Beek, NL;
Hendrik Huisman, Tilburg, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.