The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2016

Filed:

Sep. 19, 2011
Applicants:

Aurelien Philippe Jean Maclou Botman, Portland, OR (US);

Milos Toth, Glebe, AU;

Steven Randolph, Portland, OR (US);

David H. Narum, Orono, MN (US);

Inventors:

Aurelien Philippe Jean Maclou Botman, Portland, OR (US);

Milos Toth, Glebe, AU;

Steven Randolph, Portland, OR (US);

David H. Narum, Orono, MN (US);

Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/04 (2006.01); C25D 5/02 (2006.01); C25D 17/12 (2006.01); C25D 21/04 (2006.01); C25D 21/12 (2006.01); C25D 5/00 (2006.01); C25D 17/00 (2006.01);
U.S. Cl.
CPC ...
C25D 5/003 (2013.01); C25D 5/02 (2013.01); C25D 5/04 (2013.01); C25D 17/005 (2013.01); C25D 17/12 (2013.01); C25D 21/04 (2013.01); C25D 21/12 (2013.01);
Abstract

A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or microelectromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.


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