The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2016
Filed:
Mar. 12, 2013
Applicant:
Novellus Systems, Inc., San Jose, CA (US);
Inventors:
Jeong-Seok Na, San Jose, CA (US);
Sanjay Gopinath, Fremont, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/507 (2006.01);
U.S. Cl.
CPC ...
C23C 16/34 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/507 (2013.01);
Abstract
Systems and methods deposit a film on a substrate by introducing a precursor gas into a reaction volume of a processing chamber. A substrate is arranged in the reaction volume. After a predetermined soak period, the precursor gas is purged from the reaction volume. The substrate is exposed with plasma gas using a remote plasma source.