The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
May. 15, 2013
Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus
Applicant:
Lam Research Ag, Villach, AT;
Inventors:
Assignee:
LAM RESEARCH AG, Villach, AT;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/687 (2006.01); F27B 5/14 (2006.01); F27D 5/00 (2006.01); F27D 11/02 (2006.01); H01L 21/67 (2006.01); F27D 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/68728 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01); F27B 5/14 (2013.01); F27D 2003/0087 (2013.01); H01L 21/67023 (2013.01);
Abstract
An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.