The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2016
Filed:
Nov. 19, 2012
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Ralf Mueller, Aalen, DE;
Hans-Juergen Mann, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01); G02B 17/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); G02B 17/0657 (2013.01); G03F 7/70233 (2013.01); G03F 7/70275 (2013.01);
Abstract
An imaging optical system for EUV projection lithography has a plurality of mirrors for imaging an object field in an object plane into an image field in an image plane. An image-side numerical aperture of the imaging optical system is at least 0.3. The imaging optical system has a pupil obscuration which is greater than 0.40 and an image filed size of at least 1 mm×10 mm. The imaging optical system can provide high quality imaging of the object.