The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2016

Filed:

Dec. 02, 2014
Applicant:

Bruker Nano, Inc., Santa Barbara, CA (US);

Inventors:

Jian Shi, Ventura, CA (US);

Craig Prater, Goleta, CA (US);

Ji Ma, Thousand Oaks, CA (US);

Chanmin Su, Ventura, CA (US);

Assignee:

Bruke Nano, Inc., Santa Barbara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 10/06 (2010.01); G01Q 10/04 (2010.01); B82Y 35/00 (2011.01);
U.S. Cl.
CPC ...
G01Q 10/065 (2013.01); B82Y 35/00 (2013.01); G01Q 10/04 (2013.01);
Abstract

A method of operating a metrology instrument includes generating relative motion between a probe and a sample at a scan frequency using an actuator. The method also includes detecting motion of the actuator using a position sensor that exhibits noise in the detected motion, and controlling the position of the actuator using a feedback loop and a feed forward algorithm. In this embodiment, the controlling step attenuates noise in the actuator position compared to noise exhibited by the position sensor in a bandwidth of about seven times the scan frequency. Scan frequencies up to a third of the first scanner resonance frequency or greater than 300 Hz are possible.


Find Patent Forward Citations

Loading…