The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2016

Filed:

Jul. 03, 2013
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Yusuke Ominami, Tokyo, JP;

Hiroyuki Suzuki, Tokyo, JP;

Shinsuke Kawanishi, Tokyo, JP;

Masahiko Ajima, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/20 (2006.01); H01J 37/16 (2006.01); G01N 23/02 (2006.01); G01N 21/01 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/18 (2013.01); H01J 37/261 (2013.01); H01J 2237/20 (2013.01); H01J 2237/2605 (2013.01);
Abstract

All of the conventional charged particle beam devices are designed only for the observation at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure, and there is no device enabling easy observation using a typical high-vacuum charged particle microscope at atmospheric pressure or in gas atmosphere at a pressure substantially equal to the atmospheric pressure. Such a conventional technique has another problem that the distance between the diaphragm and a sample cannot be controlled, and so it has a high risk of breakage of the diaphragm. Then, the device of the present invention includes a diaphragm configured to separate a space to place a sample therein so that pressure of the space to place the sample therein is kept larger than pressure of the interior of the enclosure, the diaphragm letting the primary charged particle beam transmit or pass therethrough and being removable; a contact prevention member configured to prevent a contact between the sample and the diaphragm; and an adjustment mechanism configured to let at least a part of the contact prevention member in an optical axis direction of the charged particle optic column.


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