The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
May. 30, 2012
Yoshiyuki Kato, Miyagi, JP;
Norihiko Amikura, Miyagi, JP;
Risako Miyoshi, Miyagi, JP;
Kimihiro Fukasawa, Miyagi, JP;
Yoshiyuki Kato, Miyagi, JP;
Norihiko Amikura, Miyagi, JP;
Risako Miyoshi, Miyagi, JP;
Kimihiro Fukasawa, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
It is possible to prevent processing gases from being mixed when alternately supplying the processing gases while alternately switching the processing gases and to suppressed a transient phenomenon more efficiently as compared to conventional cases. When supplying at least two kinds of processing gases (e.g., a CFgas and a CFgas) into a processing chamber while alternately switching the at least two kinds of processing gases during a plasma process on a wafer, the supply of each processing gas can be alternately turned on and off by alternately setting an instruction flow rate of a mass flow controller to be a predetermined flow rate and a zero flow rate while a downstream opening/closing valve provided at a downstream side of the mass flow controller is open.