The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2016
Filed:
Feb. 04, 2015
Jeol Ltd., Tokyo, JP;
Masaru Takakura, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
A particle analysis instrument is offered which can make a measurement in a shorter time than heretofore. The particle analysis instrument () is used to analyze a sample (S) containing plural particles by measuring the sample over plural fields of view. The instrument () includes a measuring section () for scanning primary rays (EB) over the sample (S) and detecting a signal emanating from the sample (S), a particle area totalizing portion () for finding the area of particles for each field of view from the results of the measurement made by the measuring section () and summing up such areas of particles for all of the fields of view to find a total area of particles, and a decision portion () for making a decision as to whether the measurement process should be ended, based on the ratio of the total area of particles to an area of the sample (S) measured to obtain the total area of particles.