The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Dec. 20, 2012
Applicant:

Intermolecular, Inc., San Jose, CA (US);

Inventors:

Sergey Barabash, San Jose, CA (US);

Dipankar Pramanik, Saratoga, CA (US);

Assignee:

Intermolecular, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 23/58 (2006.01); C23C 16/40 (2006.01); H01L 45/00 (2006.01); H01L 27/12 (2006.01); H01L 27/24 (2006.01); C23C 16/02 (2006.01); C30B 25/04 (2006.01); C30B 29/16 (2006.01); C30B 29/60 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); B82Y 40/00 (2011.01); H01L 27/06 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/405 (2013.01); C23C 16/0272 (2013.01); C30B 25/04 (2013.01); C30B 29/16 (2013.01); C30B 29/60 (2013.01); H01L 21/02186 (2013.01); H01L 27/1233 (2013.01); H01L 27/2436 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01); H01L 45/04 (2013.01); H01L 45/1233 (2013.01); H01L 45/149 (2013.01); B82Y 40/00 (2013.01); H01L 27/0629 (2013.01); H01L 28/40 (2013.01); H01L 2924/0002 (2013.01); Y10S 977/811 (2013.01); Y10S 977/89 (2013.01); Y10S 977/932 (2013.01);
Abstract

Anisotropic materials, such as rutile TiO, can exhibit dielectric constant of 170 along the tetragonal axis of (001) direction, and dielectric constant of 86 along directions perpendicular to the tetragonal axis. Layer of anisotropic material nanorods, such as TiOnanorods, can form a seed layer to grow a dielectric layer that can exhibit the higher dielectric constant value in a direction parallel to the substrate surface. The anisotropic layer can then be patterned to expose a surface normal to the high dielectric constant direction. A conductive material can be formed in contact with the exposed surface to create an electrode/dielectric stack along the direction of high dielectric constant.


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