The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Nov. 18, 2013
Chin Hock Toh, Singapore, SG;
Aksel Kitowski, Singapore, SG;
Uday Mahajan, Singapore, SG;
Thean Ming Tan, Singapore, SG;
Chin Hock Toh, Singapore, SG;
Aksel Kitowski, Singapore, SG;
Uday Mahajan, Singapore, SG;
Thean Ming Tan, Singapore, SG;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Patterned photoresist is used to attach a carrier wafer to a silicon device wafer. In one example, a silicon wafer is patterned for contact bumps by applying a photoresist over a surface of the wafer and removing the photoresist in locations at which the contact bumps are to be formed. The contact bumps are formed in the locations at which the photoresist is removed. A temporary carrier is attached to the photoresist over the wafer. The back side of the wafer opposite the contact bumps is processed while handling the wafer using the temporary carrier. The temporary carrier is removed. The photoresist on the front side of the wafer with the contact bumps is removed after removing the temporary carrier.