The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Dec. 14, 2012
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Damian Fiolka, Oberkochen, DE;
Juergen Baier, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 26/06 (2006.01); G02B 26/08 (2006.01); G01B 11/14 (2006.01); G02B 5/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70266 (2013.01); G01B 11/14 (2013.01); G02B 5/09 (2013.01); G02B 26/06 (2013.01); G02B 26/0833 (2013.01); G02B 26/0858 (2013.01); G03F 7/70133 (2013.01); G03F 7/70141 (2013.01);
Abstract
An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.