The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Dec. 10, 2014
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventors:

Hiroyuki Nagahama, Saitama, JP;

Riki Ogawa, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/88 (2006.01); G01N 21/93 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8806 (2013.01); G01N 21/93 (2013.01); G01N 21/956 (2013.01); G01N 2201/06113 (2013.01);
Abstract

In a focal position adjusting method for an inspection apparatus, the inspection apparatus includes an illumination optical system and an imaging optical system configured to perform a defect inspection of a pattern formed in a sample using an image imaged on a first sensor. The focal position adjusting method includes illuminating the light from the first light source on the sample after transmitting the light through a first slit disposed in the illumination optical system. The light from the first light source is condensed into a second sensor disposed in the imaging optical system. A light intensity distribution of a pupil of the illumination optical system is observed. The focal position of the illumination optical system is adjusted by obtaining each light quantity of the front focus and the rear focus of the image of the first slit projected on the sample based on the light intensity distribution.


Find Patent Forward Citations

Nagahama, Hiroyuki. (2015). Focal position adjustment method and inspection method (U.S. Patent No. 9213001). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9213001

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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