The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Mar. 04, 2014
Globalfoundries, Inc., Grand Cayman, KY;
Jason Richard Cantone, Mechanicville, NY (US);
Linus Jang, Clifton Park, NY (US);
Jin Cho, Palo Alto, CA (US);
Ryan Ryoung-Han Kim, Albany, NY (US);
GLOBALFOUNDRIES, INC., Grand Cayman, KY;
Abstract
Methods for fabricating integrated circuits are provided. In an embodiment, a method for fabricating an integrated circuit includes forming fin structures in a selected area of a semiconductor substrate. The method includes covering the fin structures and the semiconductor substrate with a mask and forming a trench in the mask to define no more than two exposed fin structures in the selected area. Further, the method includes removing the exposed fin structures to provide the selected area with a desired number of fin structures.