The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Jul. 30, 2014
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Tasuku Matsumiya, Kawasaki, JP;
Takehiro Seshimo, Kawasaki, JP;
Ken Miyagi, Kawasaki, JP;
Takaya Maehashi, Kawasaki, JP;
Takahiro Dazai, Kawasaki, JP;
Yoshiyuki Utsumi, Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Abstract
A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the Pblock and Pblock being mutually bonded in the block copolymer, and the Pblock including a structural unit other than a structural unit constituting the Pblock; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the Pblock, a surface free energy of the Pblock and a surface free energy of the neutralization film are represented by a coordinate point A of the Pblock, a coordinate point B of the Pblock and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.