The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Oct. 22, 2012
Applicant:

Csmc Technologies Fab1 Co., Ltd., Jiangsu, CN;

Inventors:

Zhongyu Lin, Jiangsu, CN;

Meng Dai, Jiangsu, CN;

Yonghai Hu, Jiangsu, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/00 (2006.01); H01L 23/60 (2006.01); H01L 27/02 (2006.01); H01L 29/74 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 23/60 (2013.01); H01L 27/0262 (2013.01); H01L 29/0692 (2013.01); H01L 29/7436 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device for electrostatic discharge protection includes a substrate, a first well and a second well formed in the substrate. The first and second wells are formed side by side, meeting at an interface, and have a first conductivity type and a second conductivity type, respectively. A first heavily doped region and a second heavily-doped region are formed in the first well. A third heavily doped region and a fourth heavily-doped region are formed in the second well. The first, second, third, and fourth heavily-doped regions have the first, second, second, and first conductivity types, respectively. Positions of the first and second heavily-doped regions are staggered along a direction parallel to the interface.


Find Patent Forward Citations

Loading…