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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9196551 B1

PDFFull Text
Expired
Date of Patent:
Nov. 24, 2015

Filed:

Aug. 26, 2011

Automatically adjusting baking process for low-k dielectric material

Applicants:

Chia-cheng Chou, Keelung, TW;

Chung-chi Ko, Nantou, TW;

Keng-chu Lin, Ping-Tung, TW;

Shwang-ming Jeng, Hsin-Chu, TW;

Inventors:

Chia-Cheng Chou, Keelung, TW;

Chung-Chi Ko, Nantou, TW;

Keng-Chu Lin, Ping-Tung, TW;

Shwang-Ming Jeng, Hsin-Chu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Attorney:

Slater & Matsil, L.L.P.

Primary Examiner:

Scott B Geyer

Assistant Examiner:

Evren Seven

Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/66 (2006.01); H01L 21/3105 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); H01L 21/3105 (2013.01); H01L 21/31058 (2013.01); H01L 21/76814 (2013.01); H01L 21/76828 (2013.01); H01L 22/12 (2013.01);
Abstract

A method includes etching a low-k dielectric layer on a wafer to form an opening in the low-k dielectric layer. An amount of a detrimental substance in the wafer is measured to obtain a measurement result. Process conditions for baking the wafer are determined in response to the measurement result. The wafer is baked using the determined process conditions.

Find Patent Forward Citations

Chou, Chia-Cheng. (2015). Automatically adjusting baking process for low-k dielectric material (U.S. Patent No. 9196551). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9196551

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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