The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Feb. 04, 2013
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Theodorus Petrus Maria Cadee, Asten, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Ramin Badie, Eindhoven, NL;
Harmeet Singh, Fremont, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70725 (2013.01); G03F 7/70708 (2013.01); G03F 7/70733 (2013.01); H01L 21/6875 (2013.01);
Abstract
A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.