The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jun. 03, 2014
Applicant:
Strasbaugh, San Luis Obispo, CA (US);
Inventors:
William J. Kalenian, San Luis Obispo, CA (US);
Larry Spiegel, San Luis Obispo, CA (US);
Assignee:
Strasbaugh, San Luis Obispo, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/32 (2012.01);
U.S. Cl.
CPC ...
B24B 37/32 (2013.01);
Abstract
A method of polishing a wafer with a wafer carrier adapted to further reduce the edge effect and allow a wafer to be uniformly polished across its entire surface, with a retaining ring made from very hard materials such as PEEK, PET or polycarbonate with a hardness in the range of 80 to 85 Shore D, while the inner surface or insert is made of polyurethane or other material with a hardness in the range of 85 to 95 Shore A.