The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 2015

Filed:

Jan. 28, 2015
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventors:

Tomoo Motosugi, Kanagawa, JP;

Takayuki Ohnishi, Kanagawa, JP;

Kaoru Tsuruta, Kanagawa, JP;

Kenji Ohtoshi, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/16 (2006.01); G21K 5/04 (2006.01); H01J 37/317 (2006.01); H01J 37/302 (2006.01); H01J 37/21 (2006.01); H01J 37/20 (2006.01); H01J 37/10 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 37/10 (2013.01); H01J 37/20 (2013.01); H01J 37/21 (2013.01); H01J 37/3026 (2013.01); H01J 2237/0492 (2013.01); H01J 2237/063 (2013.01); H01J 2237/103 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/3173 (2013.01);
Abstract

A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.


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