The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

Jan. 07, 2013
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, JP;

Inventors:

Hirofumi Shinohara, Kawasaki, JP;

Hiromasa Yoshimori, Kawasaki, JP;

Toshiaki Iwamatsu, Kawasaki, JP;

Hidekazu Oda, Kawasaki, JP;

Assignee:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 27/088 (2006.01); H01L 21/70 (2006.01); H01L 21/8234 (2006.01); H01L 21/76 (2006.01); H01L 21/02 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02697 (2013.01); H01L 21/82385 (2013.01); H01L 21/823807 (2013.01); H01L 21/823857 (2013.01); H01L 21/823878 (2013.01); H01L 27/088 (2013.01);
Abstract

An area in a top view of a region where a low-voltage field effect transistor is formed is reduced, and an area in a top view of a region where a high-voltage field effect transistor is formed is reduced. An active region where the low-voltage field effect transistors (first nMIS and first pMIS) are formed is constituted by a first convex portion of a semiconductor substrate that projects from a surface of an element isolation portion, and an active region where the high-voltage field effect transistors (second nMIS and second pMIS) are formed is constituted by a second convex portion of the semiconductor substrate that projects from the surface of the element isolation portion, and a trench portion formed in the semiconductor substrate.


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