The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
May. 26, 2009
Christian Gerardus Norbertus Hendricus Marie Cloin, Gennep, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Olga Vladimirovna Elisseeva, Waalre, NL;
Tijmen Wilfred Mathijs Gunther, Utrecht, NL;
Michaël Christiaan Van Der Wekken, Eindhoven, NL;
Christian Gerardus Norbertus Hendricus Marie Cloin, Gennep, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Olga Vladimirovna Elisseeva, Waalre, NL;
Tijmen Wilfred Mathijs Gunther, Utrecht, NL;
Michaël Christiaan Van Der Wekken, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.