The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Feb. 13, 2014
Applicant:

Transphorm Inc., Goleta, CA (US);

Inventors:

Srabanti Chowdhury, Goleta, CA (US);

Umesh Mishra, Montecito, CA (US);

Yuvaraj Dora, Goleta, CA (US);

Assignee:

Transphorm Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/338 (2006.01); H01L 21/283 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 21/28 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01); H01L 29/417 (2006.01); H01L 29/04 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/283 (2013.01); H01L 21/28114 (2013.01); H01L 21/28593 (2013.01); H01L 21/76804 (2013.01); H01L 29/402 (2013.01); H01L 29/4236 (2013.01); H01L 29/42316 (2013.01); H01L 29/42376 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H01L 21/28581 (2013.01); H01L 21/28587 (2013.01); H01L 29/045 (2013.01); H01L 29/0696 (2013.01); H01L 29/2003 (2013.01); H01L 29/41766 (2013.01); H01L 29/4238 (2013.01);
Abstract

A III-N semiconductor HEMT device includes an electrode-defining layer on a III-N material structure. The electrode-defining layer has a recess with a first sidewall proximal to the drain and a second sidewall proximal to the source, each sidewall comprising a plurality of steps. A portion of the recess distal from the III-N material structure has a larger width than a portion of the recess proximal to the III-N material structure. An electrode is in the recess, the electrode including an extending portion over the first sidewall. A portion of the electrode-defining layer is between the extending portion and the III-N material structure. The first sidewall forms a first effective angle relative to the surface of the III-N material structure and the second sidewall forms a second effective angle relative to the surface of the III-N material structure, the second effective angle being larger than the first effective angle.


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