The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Nov. 06, 2009
Applicants:

Giovanni Calabrese, Munich, DE;

Domagoj Siprak, Munich, DE;

Wolfgang Molzer, Ottobrunn, DE;

Uwe Hodel, Munich, DE;

Inventors:

Giovanni Calabrese, Munich, DE;

Domagoj Siprak, Munich, DE;

Wolfgang Molzer, Ottobrunn, DE;

Uwe Hodel, Munich, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01); H01L 21/265 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/223 (2006.01);
U.S. Cl.
CPC ...
H01L 21/26586 (2013.01); H01L 21/26506 (2013.01); H01L 29/0619 (2013.01); H01L 29/0653 (2013.01); H01L 29/0847 (2013.01); H01L 29/66659 (2013.01); H01L 29/7835 (2013.01); H01L 21/2236 (2013.01);
Abstract

Semiconductor devices may be configured to reduce noise in the devices. For example, a semiconductor device may be configured or made with a first doped region within a semiconductor substrate to operate as an extended drain region, a trench isolation region, a second doped region between the first doped region and the trench isolation region, wherein the trench isolation region and the second doped region may be at least partially formed within the first doped region. Additionally, or alternatively, the second doped region may be within the first doped region and at least partially surround the trench isolation region, the first and second doped regions may have the same conductivity type, and the second doped region may have a higher conductivity than the first doped region.


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